Karl suss ma6 user manual

Karl suss ma56ma 56 mpm gaas mask aligner comes with what you see in the pictures. Usage policies notebook for karl suss ma6 mid deep uv. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6 in diameter. Karl suss mjb3 precision high performance mask alignment and exposure system. Mask aligner karl suss ma6 user manual 20171006 stage micrometers to 10 ten.

After reading this manual, the user should be able to describe a typical ma6 process for both top and backside alignment, explain the theory. Karl suss ma6 mask aligner standard operating procedures. Karl suss ma6 ba6 with backside alignment bsa manufacturer. The new detector pair is on the left, the previous detector pair on the right. Karl suss ma6 mask aligner sop research service centers. We have 2 karl suss ma6 manuals available for free pdf download. Karl suss mjb3 uv400 mask aligner the mask aligner is used in photolithography to transfer features. Introduction the karl suss ma6pan is a contact aligners used for optical lithography down to 1 micron.

Our range of services begins with the installation and startup of the systems including user training. Karl suss ma6 top and bottom side aligners ucla nanolab. The suss rc8 is a modular system designed to be adapted to wide range of applications within the resist coating regime. The user must make certain the operators are familiar with the procedure. Update 412012 we now have available an iline filter 365nm and a new dual detector pair. Karl suss mjb3 uv400 mask aligner standard operating. Advanced energy akrion amat 0190 amat dps anti static mat aoi asml asymtek baratron boom stand microscope brooks automation canon stepper contact systems dage. These instructions are intended for reference only, and will not replace the thorough training required for proper system operation. It is still installed in a cleanroom and fully functional. Suss microtec solutions for imprint lithography are based on manual mask aligner platforms and support a wide range of materials and substrate with sizes up to 200 mm. Usage policies notebook for karl suss ma6 mid deep. Start to reading this manual, some rules are applica.

It offers unsurpassed flexibility in the handling of irregularly shaped substrates of. Before turning on the ma6ba6 machine, users should prepare the bondalign ba6. Ask a salesperson about available mask and chuck sizes. Toggle the mask vacuum on by pressing the enter key.

Karl suss ma6 manual if searched for a book karl suss ma6 manual in pdf form, then you have come on to right site. Peter nowak x73246 just dial this directly on any campus phone. Susstec manual resist spinners suss ma6ba6 contact aligner ma6ba6. Pull the slide out, place the wafer on the chuck using the 3 alignment pins for accurate positioning of the wafer flats. Karl suss mjb3 mask aligner users manual version date sections affected author 1. The ma6 is ideal for use with iline 365 nm resists. If not, ask for assistance you may call mita lab at 26730 or send a. Press change mask, take out the mask holder and put it on the mask station. The ma6ba6 is a maskwafer aligner for research and development, designed to align and expose wafers up to 6 inch 150 mm diameter. Susstec manual resist spinners suss ma6 ba6 contact aligner ma6 ba6. View photo gallery view video tutorial download standard operating procedures. Robert white, mechanical engineering x72210 safety office. Karl suss mjb3 uv400 mask aligner standard operating procedure.

Usage policies notebook for karl suss ma6 mid deep uv mask. Roger robbins control electronics power switch is a momentary engage switch used to. Sums ien ien micronano fabrication facility karl suss tsa ma6 mask alignerthe georgia tech karl suss tsa ma6 mask aligner offers high quality exposure optics for high resolution and optimum edge quality with 0. Karl suss contact aligner operation page 10 of 28 document number. Karl suss contact aligner operation university of texas. View and download karl suss ma6 operating manual online. Karl suss mjb3 uv400 mask aligner operating procedure version 1. The following is a description of how to setup and operate the karl suss ma6 ba6 contact printer. It uses 5 masks system and it can be operated manually. Equipment manual contents university of california, berkeley. Evg620nt semiautomated double side mask alignment system up to 150mm, double side, manual handling broad band uv source exposure modes. View online or download karl suss ma6 operating manual.

If not, ask for assistance you may call mita lab at 26730 or send a mail to the. The ma6 is ideal for use with iline 365 nm resists and is. Georgia tech sums shared user management system ien ien micronano fabrication facility elionix elsg100 ebl systemthe elionix els g100 is a highspeed, ultra highprecision thermal field emission tfe electron beam lithography system. Evg 620 mask aligner shared user management system. Description the karl suss mask aligner performs high resolution photolithography. Ma6ba6 karl suss maba 6 contact aligner the versitile mask holder allows both round and square plates as masks, and the sample plate. Karl suss ma6 mask aligner standard operating procedure faculty supervisor.

It has a manual cassette load with uv400 exposure optics 365nm and 10x objective lens. Karl suss ma6 manual topside aligner complete tool 150mm. Karl suss ma6 operating manual 24 pages mask aligner. Specifications are from the karl suss manual and definitely has specifications for items that dont seem to be included and may vary slightly due to upgrades, options, or revisions this unit may or may not have. Karl suss ma6 duv mask aligner standard operating procedure. Move the microscope up over the safety line with the z knob at the left of the base of the microscope. After reading this manual, the user should be able to describe a typical ma6 process for. This part is not covered in this manual yet, because the author has not used the machine yet. All contact exposure programs vacuum, hard, soft contact and proximity are provided.

System capable of exposing partial wafers or substrates up to a maximum size of 3 in. Seller of used and refurbished semiconductor equipment. The karl suss ma6 is a top and bottom side contact printer used for fine lithography down to 1 micron or better. We presented the full variation of this ebook in txt, pdf, djvu, doc, epub formats. Home buy equipment semiconductor fabrication litho karl suss ma6 manual topside aligner complete tool 150mm. Karl suss pa 200 user manual karl suss pa 200 user manual equipment classification georgia tech cleanroom the hitachi s3700n variable pressure sem features a low vacuum observation of 6 270 pa pm8 karl suss manual karl suss manual probe station analytical wafer prober other images. Flexible 200mm mask aligner with duv light source karl suss rc8 rc8. Usage policies for karl suss ma6 mask aligner standard policies for usage the karl suss mask aligner performs high resolution photolithography. It is capable of processing both 4 wafers, 6 wafers, and chipspieces. Ma6 6 aligner karl suss microtech ma6 6 aligner the karl suss ma6 is a top and bottom side contact printer used for fine lithography down to 1 micron or better. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6 in.

The mjb4 is the next manual mask aligner following the mjb3. Suss microtec karl suss equipment spec equipment corporation. Activate the mechanical mask clamp by pressing on the leaf spring until it contacts the edge of the mask. Used karl suss ma6 6 aligner for sale in usa kitmondo. Ma6 ba6 karl suss maba 6 contact aligner the versitile mask holder allows both round and square plates as masks, and the sample plate. First mask, top side alignment tsa or back side alignment bsa. Karl suss mjb3 uv400 mask aligner thayer school of.

Karl suss contact aligner operation page 5 of 28 document number. With suss microtec, you have a committed partner at your side for the entire life cycle of your machinery. Page 1 karl suss ma6ba6 mask aligner users manual coral name. Substrates up to 6 inches in diameter and square substrates of small dimensions can be processed. It is the ideal, economical tool for laboratories and small series production. The karl suss mask aligner performs high resolution photolithography. Furthermore, suss platforms provide the capability of aligning and levelling stamps to substrates, as required by many imprint applications. In its contact exposure modes, the equipment can achieve a resolution of 0. This operation manual is intended to describe the operation procedures for. University of minnesota nano fabrication center standard operating procedure 1 equipment name. The machine is widely used for mems and optoelectronics. Suss ma1006 operator manual oindex 6 operating procedures of the ma1006 17 6.

The karl suss ma6 is a top and bottom side mask aligner used for fine lithography down to 1 micron and better. The karl suss ma6 is a top and bottom side contact lithography printer used for fine line lithography down to 1 micron or better. If you have experience with semiconductor device parameter analyzer, in particular keysight b1500a, you may try to use it by yourself, with much care. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard. Karl suss ma150 mask aligner with cassette to cassette automatic wafer handling. Wafers, coated with photosensitive resists pr, are exposed through a glasschrome mask using a short few seconds pulse of uv radiation from a mercury hg lamp, with spectral lines at 365nm, 405nm and 436nm. Sums ien ien micronano fabrication facility karl suss tsa ma 6 mask alignerthe georgia tech karl suss tsa ma6 mask aligner offers high quality exposure optics for high resolution and optimum edge quality with 0. Ma6ba6 mask aligner equipment standard operating procedure. The karl suss ma6 is a top and bottom side mask aligner used for fine lithography down to 1 micron or below. Furthermore, suss platforms provide the capability of aligning and levelling stamps to. The ma6 is ideal for use with iline 365 nm and gline 436 nm resists.

Feb 25, 2014 the karl suss mask aligner performs high resolution photolithography. These instructions are written in a step by step order to print. The ma6 is ideal for use with iline 365 nm resists and is capable of processing up to 6inch wafers. First mask exposure start the wafer loading procedure by pressing the key load and follow the instruction given on the ma6 display. The karl suss ma6 ba6 is exclusively intended for use as an alignment andor exposure device for substrates used in semiconductor and microsystems technology. Introduction the karl suss ma6 pan is a contact aligners used for optical lithography down to 1 micron. Karl suss equipment is designed to protect the user against all possible hazards. Karl suss ma6 sop rev 10 01242017 page 3 of 11 to the left and top of the mask.